Studies on Electroplated Copper Indium Telluride Thin Films

Studies on Electroplated Copper Indium Telluride Thin Films

T. MahalingamS. Thanikaikarasan C. Sanjeeviraja Taekyu Kim P.J. Sebastian Yong Deak Kim 

Department of Physics, Alagappa, University, Karaikudi-630 003, India

Centre for Modeling and Simulation Studies, Security Management Institute, Kangnam-Ku, Seoul- 135 731, Republic of Korea

Solar Hydrogen Fuel Cell Group, Energy Research Centre, UNAM, 62580, Temixco, Morelos, Mexico

Department of Electrical and Computer Engineering, Ajou University, Suwon-443 749. Republic of Korea

Corresponding Author Email:
29 July 2009
4 August 2009
4 August 2009
| Citation

Thin films of copper indium telluride were electrodeposited on indium doped tin oxide coated conducting glass (ITO) substrates at various bath temperatures and deposition potentials from an aqueous acidic bath containing CuSO4, In2(SO4)3 and TeO2. The deposited films were characterized by x-ray diffraction, scanning electron microscopy, energy dispersive analysis of x-rays and optical absorption techniques, respectively. The film structure was found to be cubic with preferential orientation along (200) plane. Using x-ray diffraction data the microstructural parameters such as crystallite size, strain, dislocation density and stacking fault probability were calculated. The variation of microstructural parameters with bath temperature and deposition potential were studied. The experimental observations are discussed in detail.


thin films, CuInTe2, x-ray diffraction, microstructural parameters, optical properties, surface morphology.

1. Introduction
2. Experimental Details
3. Results and Discussion
4. Conclusions

One of the authors (S.Thanikaikarasan) is highly thanks to Council of Scientific and Industrial Research (CSIR), New Delhi for the award of Senior Research Fellowship (SRF) to carry out this research work.


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