Growth and Characterization of Electroplated NiO Coatings

Growth and Characterization of Electroplated NiO Coatings

B. Bharathi S. Thanikaikarasan* Pratap Kollu P.V. Chandrasekar T. Mahalingam Luis Lxtlilco

Centre for Scientific and Applied Research, School of Basic Engineering and Sciences, PSN College of Engineering and Technology, Tirunelveli – 627 152, Tamil Nadu, India.

DST-INSPIRE Faculty, Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology, Mumbai – 400 076, Maharashtra, India.

College of Physics and Information Engineering, Institute of Optoelectronic Display, Fuzhou University, Fuzhou-350002, Republic of China.

Department of Electrical and Computer Engineering, Ajou University, Suwon – 443 749, South Korea.

Universidad Politecnica del Estado de Guerrero, Puente Campusano, Taxco, Guerrero, 40290, Mexico.

Corresponding Author Email: 
S_thanikai@rediffmail.com
Page: 
173-177
|
DOI: 
https://doi.org/10.14447/jnmes.v17i3.418
Received: 
February 10, 2014
|
Accepted: 
July 15, 2014
|
Published: 
October 03, 2014
| Citation
Abstract: 

Thin films of NiO have been prepared using potentiostatic electrodeposition technique from an aqueous electrolytic bath containing NiSO4. Deposited films have been characterized using x-ray diffraction, scanning electron microscopy and energy dispersive analysis by x-rays. X-ray diffraction patterns showed that the prepared films possess polycrystalline nature with face centered cubic structure. Surface morphology and film composition showed that films with better stoichiometry and smooth surface are obtained at optimized growth condition. Optical absorption analysis showed that the prepared films possess direct band gap value around 3.46 eV.

Keywords: 

NiO; thin films, electrodeposition; x-ray diffraction; optical absorption analysis

1. Introduction
2. Experimental Details
3. Results and Discussion
4. Conclusions
Acknowledgement

The corresponding author (S. Thanikaikarasan) gratefully acknowledges the Board of Research in Nuclear Sciences–Department of Atomic Energy (BRNS-DAE), Mumbai, India for providing Electroplating Unit through Equipment Head with File No.2012/34/13/BRNS/No.166 to carry out this work. This work was partially supported by DGAPA-UNAM through the project IT 100413.

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