Electrochemical Deposition and Characterization of Lead Telluride Thin Films

Electrochemical Deposition and Characterization of Lead Telluride Thin Films

T. MahalingamS. Thanikaikarasan K. Sundaram M. Raja Jin-Koo Rhee 

Department of Physics, Alagappa University, Karaikudi-630 003, India

Millimeter-Wave Innovation Technology (MINT) Research Center, Department of Electronics Engineering, Dongguk University Seoul 100-715, Korea

Corresponding Author Email: 
29 July 2009
4 August 2009
4 August 2009
| Citation

Electrochemical deposition and characterization of Lead Telluride (PbTe) thin films onto indium doped tin oxide (ITO) coated conducting glass substrates from an aqueous acidic bath containing Pb(NO3)2 and TeO2 is discussed in this paper. The effect of bath temperature on the properties of PbTe films have been studied. The films deposited in the bath temperature range from 30ºC to 90ºC are characterized by x-ray diffraction, scanning electron microscopy, energy dispersive analysis of x-rays and optical absorption techniques for their structural, morphological, compositional and optical properties. The effects of bath temperature on the above properties of the films are discussed in detail.


Lead chalcogenides, electrodeposition, x-ray diffraction, texture coefficient, scanning electron microscopy.

1. Introduction
2. Experimental Details
3. Results and Discussion
4. Conclusions

One of the authors (S.Thanikaikarasan) is highly thanks to Council of Scientific and Industrial Research (CSIR), New Delhi for the award of Senior Research Fellowship (SRF) to carry out this research work.


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